| ID | Category | Equipment | Manufacturer | Model | Size |
| W150306017 | DEPOSITION | CVD | NOVELLUS | Concept One | 8 |
| W150306022 | IMPLANTER | MIDDLE_CURRENT_I/I | EATON_NOVA | SEN MC-3 | 8 |
| W150306023 | DIFFUSION | RTP_EQUIPMENT | AMAT | Centura | |
| W150626009 | LITHOGRAPHY | SCANNER | CANON | ES4/ES5/ES6 | 12 |
| W150626010 | LITHOGRAPHY | SCANNER | CANON | FPA-5510iz | 12 |
| W150626011 | DEPOSITION | CVD | AMAT | Producer(GT TEOS) | 12 |
| W150626016 | ASSEMBLY | DIE_BONDER | ASM | SD890A | |
| W150626017 | ASSEMBLY | DIE_BONDER | ASM | SD832 | |
| W150626018 | ASSEMBLY | DIE_BONDER | CANON MACHINERY | CPS-400 | |
| W150715007 | LITHOGRAPHY | STEPPER | NIKON | SF100 | |
| W150715010 | LITHOGRAPHY | COATER_DEVELOPER | TEL | ACT8 | 8 |
| W150715011 | LITHOGRAPHY | DEVELOPER | TEL | Mark8 | 8 |
| W150715012 | LITHOGRAPHY | STEPPER | NIKON | i11 | 8 |
| W150715019 | ETCHER | ETCHER | HITACHI | M511 | 6 |
| W160314001 | DEPOSITION | SPUTTER | ANELVA | L-430S-FHL | |
| W160314002 | DEPOSITION | SPUTTER | ANELVA | CS-200 | |
| W160318002 | METROLOGY | CDSEM | HITACHI | S7800H | |
| W160318003 | LITHOGRAPHY | COATER_DEVELOPER | TEL | ACT8 | |
| W160318004 | LITHOGRAPHY | SOG_COATER | TEL | Mark-Vz | 6 |
| W160617052 | METROLOGY | SEM | HITACHI | S-4800 | |
| W160617060 | LITHOGRAPHY | UV_CURE | USHIO | UMA-802-HC552 | |
| W160627002 | ETCHER | ETCHER | AMAT | Ceturer DPSII METAL | 8 |
| W160627003 | DEPOSITION | APCVD | AMAYA | AMAX-800 | |
| W160627004 | LITHOGRAPHY | STEPPER | ULTRATECH | Ultratec M1100 | |
